IEEE TSM

Models of Clustered Photolithography Tools for Fab-Level Simulation: From Affine to Flow Line
Fab-level discrete-event simulation is an important practical tool for the analysis and optimization of semiconductor wafer …
Jung Yeon Park, Kyungsu Park, James R. Morrison
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Models of Clustered Photolithography Tools for Fab-Level Simulation: From Affine to Flow Line
Exit Recursion Models of Clustered Photolithography Tools for Fab Level Simulation
In semiconductor wafer fabricators (fabs), clustered photolithography tools (CPTs) are often the bottleneck. With a focus on fab-level …
Jung Yeon Park, Kyungsu Park, James R. Morrison
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Exit Recursion Models of Clustered Photolithography Tools for Fab Level Simulation